Submicron imaging with a planar silver lens
Abstract
Optical imaging through a thin planar silver layer has been achieved by utilizing near-field lithography techniques. A 120 nm thick silver lens that was placed 60 nm below a patterned mask, imaged the mask’s features onto a photosensitive material located 60 nm below the silver. The entire structure was exposed from above with a mercury lamp. Features sizes as small as 350 nm (at a 700 nm period) were imaged onto the photosensitive material, demonstrating the lensing ability of the planar silver slab.
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| Titel | Submicron imaging with a planar silver lens |
|---|---|
| Medien | Appl. Phys. Lett. |
| Verlag | --- |
| Heft | 22 |
| Band | 84 |
| ISBN | --- |
| Verfasser/Herausgeber | David O. S. Melville, R. J. Blaikie, Prof. Dr. Conrad R. Wolf |
| Seiten | 4403-4405 |
| Veröffentlichungsdatum | 12.05.2004 |
| Projekttitel | --- |
| Zitation | Melville, David O. S.; Blaikie, R. J.; Wolf, Conrad R. (2004): Submicron imaging with a planar silver lens. Appl. Phys. Lett. 84 (22), S. 4403-4405. DOI: 10.1063/1.1757644 |